Simulation study of zone-height limit by electron beam lithography for 30 nm Fresnel zone plates in X ray optics
| Autor: | Chen, Qiucheng, Mu, Chengyang, Tong, Xujie, Zhao, Jun, Wu, Qingxin, Chen, Yifang |
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| Zdroj: | In Microelectronic Engineering 15 March 2023 273 |
| Databáze: | ScienceDirect |
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