On the influence of Ni(Pt)Si thin film formation on agglomeration threshold temperature and its impact on 3D imaging technology integration
| Autor: | Grégoire, M., Morris Anak, F., Verdier, S., Dabertrand, K., Guillemin, S., Mangelinck, D. |
|---|---|
| Zdroj: | In Microelectronic Engineering 1 March 2023 271-272 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect