Etching of sub-10 nm half-pitch high chi block copolymers for directed self-assembly (DSA) application
| Autor: | Gusmão Cacho, Maria Gabriela, Pimenta-Barros, Patricia, Argoud, Maxime, Navarro, Christophe, Sakavuyi, Kaumba, Tiron, Raluca, Possémé, Nicolas |
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| Zdroj: | In Microelectronic Engineering 1 June 2020 230 |
| Databáze: | ScienceDirect |
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