XPS study of a selective GaN etching process using self-limiting cyclic approach for power devices application
| Autor: | Le Roux, Frédéric, Possémé, Nicolas, Burtin, Pauline, Barnola, Sébastien, Torres, Alphonse |
|---|---|
| Zdroj: | In Microelectronic Engineering 1 May 2020 228 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect