Effect of concentration change of 0.1% triton added 25 wt% TMAH during fabrication of deep cavities with mesa structures in SOI wafer
| Autor: | Menon, P. Krishna, Ashok, Akarapu, Rao, A.V. Narasimha, Pandey, Ashok Kumar, Pal, Prem |
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| Zdroj: | In Microelectronic Engineering 15 April 2020 227 |
| Databáze: | ScienceDirect |
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