Utilizing the superior etch stop quality of HfO2 in the front end of line wafer scale integration of silicon nanowire biosensors
| Autor: | Jayakumar, G., Hellström, P.-E., Östling, M. |
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| Zdroj: | In Microelectronic Engineering 1 May 2019 212:13-20 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect