Thermal and radiation chemistry of butyltin oxo hydroxo: A model inorganic photoresist

Autor: Frederick, Ryan T. a, 1, Saha, Sumit b, 1, Trey Diulus, J. a, 1, Luo, Feixiang c, Amador, Jenn M. b, Li, Mengjun c, Park, Deok-Hie b, Garfunkel, Eric L. c, Keszler, Douglas A. b, Herman, Gregory S. a, ⁎
Zdroj: In Microelectronic Engineering 15 January 2019 205:26-31
Databáze: ScienceDirect