Thermal and radiation chemistry of butyltin oxo hydroxo: A model inorganic photoresist
Autor: | Frederick, Ryan T. a, 1, Saha, Sumit b, 1, Trey Diulus, J. a, 1, Luo, Feixiang c, Amador, Jenn M. b, Li, Mengjun c, Park, Deok-Hie b, Garfunkel, Eric L. c, Keszler, Douglas A. b, Herman, Gregory S. a, ⁎ |
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Zdroj: | In Microelectronic Engineering 15 January 2019 205:26-31 |
Databáze: | ScienceDirect |
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