GeSn surface preparation by wet cleaning and in-situ plasma treatments prior to metallization
| Autor: | Raynal, P.E., Quintero, A., Loup, V., Rodriguez, Ph., Vallier, L., Aubin, J., Hartmann, J.M., Chevalier, N., Besson, P. |
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| Zdroj: | In Microelectronic Engineering 1 January 2019 203-204:38-43 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect