Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays

Autor: Zhang, Qingzhu, Tu, Hailing, Yin, Huaxiang, Wei, Feng, Li, Junjie, Meng, Lingkuan, Zhang, Zhaohao, Yan, Jiang, Zhao, Hongbin, Ma, Tongda, Zhou, Zhangyu, Fan, Yanyan, Du, Jun
Zdroj: In Microelectronic Engineering 15 October 2018 198:48-54
Databáze: ScienceDirect