A non-destructive, fast evaluation of PVD diffusion barriers deposited on porous low-k dielectrics
| Autor: | Wang, Yingjie, He, Peng, Zhang, Jing, Yan, Jiang, Lopaev, Dmitry V., Qu, Xin-Ping, Baklanov, Mikhail R. |
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| Zdroj: | In Microelectronic Engineering 15 October 2018 198:22-28 |
| Databáze: | ScienceDirect |
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