A wafer-scaled III-V vertical FET fabrication by means of plasma etching
| Autor: | Milenin, A.P., Veloso, A., Collaert, N., Piumi, D. |
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| Zdroj: | In Microelectronic Engineering 15 May 2018 192:14-18 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Milenin, A.P., Veloso, A., Collaert, N., Piumi, D. |
|---|---|
| Zdroj: | In Microelectronic Engineering 15 May 2018 192:14-18 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect