Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs
Autor: | Qin, Changliang, Yin, Huaxiang, Wang, Guilei, Hong, Peizhen, Ma, Xiaolong, Cui, Hushan, Lu, Yihong, Meng, Lingkuan, Yin, Haizhou, Zhong, Huicai, Yan, Jiang, Zhu, Huilong, Xu, Qiuxia, Li, Junfeng, Zhao, Chao, Radamson, Henry H. |
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Zdroj: | In Microelectronic Engineering 5 September 2017 181:22-28 |
Databáze: | ScienceDirect |
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