Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs

Autor: Qin, Changliang, Yin, Huaxiang, Wang, Guilei, Hong, Peizhen, Ma, Xiaolong, Cui, Hushan, Lu, Yihong, Meng, Lingkuan, Yin, Haizhou, Zhong, Huicai, Yan, Jiang, Zhu, Huilong, Xu, Qiuxia, Li, Junfeng, Zhao, Chao, Radamson, Henry H.
Zdroj: In Microelectronic Engineering 5 September 2017 181:22-28
Databáze: ScienceDirect