Photoetching method that provides improved silicon-on-insulator layer thickness uniformity in a defined area
| Autor: | Miyata, Yuki, Nakamukai, Yasunori, Azevedo, Cassia Tiemi, Morita, Miho, Uchikoshi, Junichi, Kawai, Kentaro, Arima, Kenta, Morita, Mizuho |
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| Zdroj: | In Microelectronic Engineering 5 August 2017 180:93-95 |
| Databáze: | ScienceDirect |
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