Technology and characterization of MIS structures with co-doped silicon nanocrystals (Si-NCs) embedded in hafnium oxide (HfOx) ultra-thin layers
| Autor: | Mazurak, A., Mroczyński, R., Jasiński, J., Tanous, D., Majkusiak, B., Kano, S., Sugimoto, H., Fujii, M., Valenta, J. |
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| Zdroj: | In Microelectronic Engineering 25 June 2017 178:298-303 |
| Databáze: | ScienceDirect |
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