Ultra-high thermal stability and extremely low Dit on HfO2/p-GaAs(001) interface

Autor: Wan, H.W., Lin, Y.H., Lin, K.Y., Chang, T.W., Cai, R.F., Kwo, J., Hong, M.
Zdroj: In Microelectronic Engineering 25 June 2017 178:154-157
Databáze: ScienceDirect
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