Examining the relationship between capacitance-voltage hysteresis and accumulation frequency dispersion in InGaAs metal-oxide-semiconductor structures based on the response to post-metal annealing

Autor: Lin, Jun, Monaghan, Scott, Cherkaoui, Karim, Povey, Ian M., Sheehan, Brendan, Hurley, Paul K.
Zdroj: In Microelectronic Engineering 25 June 2017 178:204-208
Databáze: ScienceDirect