Optimizing process conditions for improved Hf1 − xZrxO2 ferroelectric capacitor performance
| Autor: | Mittmann, Terence, Fengler, Franz P.G., Richter, Claudia, Park, Min Hyuk, Mikolajick, Thomas, Schroeder, Uwe |
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| Zdroj: | In Microelectronic Engineering 25 June 2017 178:48-51 |
| Databáze: | ScienceDirect |
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