Improvement of etching and cleaning methods for integration of raised source and drain in FD-SOI technologies

Autor: Labrot, M., Cheynis, F., Barge, D., Maury, P., Juhel, M., Lagrasta, S., Müller, P.
Zdroj: In Microelectronic Engineering 5 August 2017 180:56-64
Databáze: ScienceDirect