Temperature dependency of the strain distribution induced by TSVs in silicon: A comparative study between micro-Laue and monochromatic nano-diffraction
| Autor: | Vianne, B., Escoubas, S., Krauss, C., Richard, M.-I., Labat, S., Chahine, G., Micha, J.-S., Schülli, T., Fiori, V., Farcy, A., Thomas, O. |
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| Zdroj: | In Microelectronic Engineering 20 April 2016 156:59-64 |
| Databáze: | ScienceDirect |
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