TCAD performance analysis of high-K dielectrics for gate all around InAs nanowire transistor considering scaling of gate dielectric thickness
| Autor: | Gupta, Richa, Vaid, Rakesh |
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| Zdroj: | In Microelectronic Engineering 1 July 2016 160:22-26 |
| Databáze: | ScienceDirect |
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