Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
| Autor: | Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M., Robinson, Alex P.G., Boden, Stuart A. |
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| Zdroj: | In Microelectronic Engineering 2 April 2016 155:74-78 |
| Databáze: | ScienceDirect |
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