Device Simulations on Novel High Channel Mobility 4H-SiC Trench MOSFETs and Their Fabrication Processes

Autor: Rossmann, H.R., Bubendorf, A., Zanella, F., Marjanović, N., Schnieper, M., Meyer, E., Jung, T.A., Gobrecht, J., Minamisawa, R.A., Bartolf, H.
Zdroj: In Microelectronic Engineering 1 September 2015 145:166-169
Databáze: ScienceDirect