Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm)
| Autor: | Cardineau, Brian, Del Re, Ryan, Marnell, Miles, Al-Mashat, Hashim, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Freedman, Daniel A., Brainard, Robert L. |
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| Zdroj: | In Microelectronic Engineering 5 September 2014 127:44-50 |
| Databáze: | ScienceDirect |
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