Photolithography and plasma processing of polymeric lab on chip for wetting and fouling control and cell patterning

Autor: Tsougeni, K., Bourkoula, A., Petrou, P., Tserepi, A., Kakabakos, S.E., Gogolides, E.
Zdroj: In Microelectronic Engineering 25 July 2014 124:47-52
Databáze: ScienceDirect