Temperature dependency of the kinetics of PureB CVD deposition over patterned Si/SiO2 surfaces

Autor: Mohammadi, V., Golshani, N., Mok, K.R.C., de Boer, W.B., Derakhshandeh, J., Nanver, L.K.
Zdroj: In Microelectronic Engineering 1 August 2014 125:45-50
Databáze: ScienceDirect