Reduction of pattern peeling in step-and-flash imprint lithography
| Autor: | Takei, Satoshi, Ogawa, Tsuyoshi, Deschner, Ryan, Willson, Carlton Grant |
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| Zdroj: | In Microelectronic Engineering 25 March 2014 116:44-50 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Takei, Satoshi, Ogawa, Tsuyoshi, Deschner, Ryan, Willson, Carlton Grant |
|---|---|
| Zdroj: | In Microelectronic Engineering 25 March 2014 116:44-50 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect