ALD deposited ZrO2 ultrathin layers on Si and Ge substrates: A multiple technique characterization
| Autor: | Botzakaki, M.A., Xanthopoulos, N., Makarona, E., Tsamis, C., Kennou, S., Ladas, S., Georga, S.N., Krontiras, C.A. |
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| Zdroj: | In Microelectronic Engineering December 2013 112:208-212 |
| Databáze: | ScienceDirect |
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