Effect of TSV density on local stress concentration: Micro-Raman spectroscopy measurement and Finite Element Analysis

Autor: Le Texier, F., Mazuir, J., Su, M., Castagné, L., Souriau, J.-C., Liotard, J.-L., Saadaoui, M., Inal, K.
Zdroj: In Microelectronic Engineering June 2013 106:139-143
Databáze: ScienceDirect