Analysis of the reverse patterning phenomenon caused by a light source change in an attenuated phase shift mask
| Autor: | Kim, Chulho, Lee, Daeyoup, Kang, Changjin, Chung, Chilhee, Choi, Byoungdeog |
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| Zdroj: | In Microelectronic Engineering April 2013 104:33-36 |
| Databáze: | ScienceDirect |
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