Reversed order hybrid lithography of T-NIL and UVL
| Autor: | Dhima, Khalid, Steinberg, Christian, Mayer, Andre, Wang, Si, Möllenbeck, Saskia, Scheer, Hella-Christin |
|---|---|
| Zdroj: | In Microelectronic Engineering December 2012 100:37-40 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect