Negative hybrid sol–gel resist as hard etching mask for pattern transfer with dry etching

Autor: Grenci, Gianluca, Della Giustina, Gioia, Pozzato, Alessandro, Zanchetta, Erika, Tormen, Massimo, Brusatin, Giovanna
Zdroj: In Microelectronic Engineering October 2012 98:134-137
Databáze: ScienceDirect