Negative hybrid sol–gel resist as hard etching mask for pattern transfer with dry etching
Autor: | Grenci, Gianluca, Della Giustina, Gioia, Pozzato, Alessandro, Zanchetta, Erika, Tormen, Massimo, Brusatin, Giovanna |
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Zdroj: | In Microelectronic Engineering October 2012 98:134-137 |
Databáze: | ScienceDirect |
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