Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes
| Autor: | Nadzeyka, A., Peto, L., Bauerdick, S., Mayer, M., Keskinbora, K., Grévent, C., Weigand, M., Hirscher, M., Schütz, G. |
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| Zdroj: | In Microelectronic Engineering October 2012 98:198-201 |
| Databáze: | ScienceDirect |
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