High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer
| Autor: | Frommhold, Andreas, Robinson, Alex P.G., Tarte, Edward |
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| Zdroj: | In Microelectronic Engineering November 2012 99:43-49 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect