The structural and electrical characterization of a HfErOx dielectric for MIM capacitor DRAM applications
| Autor: | Toomey, B., Cherkaoui, K., Monaghan, S., Djara, V., O’Connor, É., O’Connell, D., Oberbeck, L., Tois, E., Blomberg, T., Newcomb, S.B., Hurley, P.K. |
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| Zdroj: | In Microelectronic Engineering June 2012 94:7-10 |
| Databáze: | ScienceDirect |
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