New generation of reactive pre-clean prior to barrier–seed deposition to preserve ULK integrity
| Autor: | Delavant, M., Guillan, J., Galpin, D., Chhun, S., Juhel, M., Guiheux, D., Jian, P., Ha, T.H., Forster, J., Guggilla, S., Hong, S., Bozon, B. |
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| Zdroj: | In Microelectronic Engineering April 2012 92:38-41 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect