Thermal design of hot plate for 300-mm wafer heating in post-exposure bake

Autor: Lee, Jinho, Kwon, Hyun Goo, Shin, Sangwoo, Han, Sangjo, Ha, Jungik, Yoo, Hosun, Cho, Hyung Hee
Zdroj: In Microelectronic Engineering 2011 88(11):3195-3198
Databáze: ScienceDirect