Effect of hydrogen atmosphere in Cu thin film growth by chemical vapor deposition using Cu(dmamb) 2
| Autor: | Choi, Jong Mun, Lee, Dohan, Park, Ji Hun, Kim, Chang Gyoun, Chung, Taek-Mo, Kim, Baek-Mann, Byun, Dongjin |
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| Zdroj: | In Microelectronic Engineering 2012 89:109-115 |
| Databáze: | ScienceDirect |
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