Study of metal barrier deposition-induced damage to porous low- k materials

Autor: Zhao, Larry, Volders, Henny, Baklanov, Mikhail, Tőkei, Zsolt, Pantouvaki, Marianna, Wilson, Christopher J., Van Besien, Els, Beyer, Gerald P., Claeys, Cor
Zdroj: In Microelectronic Engineering 2011 88(9):3030-3034
Databáze: ScienceDirect