Study of metal barrier deposition-induced damage to porous low- k materials
Autor: | Zhao, Larry, Volders, Henny, Baklanov, Mikhail, Tőkei, Zsolt, Pantouvaki, Marianna, Wilson, Christopher J., Van Besien, Els, Beyer, Gerald P., Claeys, Cor |
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Zdroj: | In Microelectronic Engineering 2011 88(9):3030-3034 |
Databáze: | ScienceDirect |
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