Ultrathin EOT high- κ/metal gate devices for future technologies: Challenges, achievements and perspectives (invited)
| Autor: | Ragnarsson, L.-Å., Chiarella, T., Togo, M., Schram, T., Absil, P., Hoffmann, T. |
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| Zdroj: | In Microelectronic Engineering 2011 88(7):1317-1322 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect