Improved EOT and leakage current for metal–insulator–metal capacitor stacks with rutile TiO 2

Autor: Popovici, Mihaela, Kim, Min-Soo, Tomida, Kazuyuki, Swerts, Johan, Tielens, Hilde, Moussa, Alain, Richard, Olivier, Bender, Hugo, Franquet, Alexis, Conard, Thierry, Altimime, Laith, Elshocht, Sven Van, Kittl, Jorge A.
Zdroj: In Microelectronic Engineering 2011 88(7):1517-1520
Databáze: ScienceDirect