Lanthanum diffusion in the TiN/LaO x/HfSiO/SiO 2/Si stack
| Autor: | Martinez, E., Ronsheim, P., Barnes, J.-P., Rochat, N., Py, M., Hatzistergos, M., Renault, O., Silly, M., Sirotti, F., Bertin, F., Gambacorti, N. |
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| Zdroj: | In Microelectronic Engineering 2011 88(7):1349-1352 |
| Databáze: | ScienceDirect |
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