Electrostatic clamping with an EUVL mask chuck: Particle issues

Autor: Kalkowski, Gerhard, Zeuske, Jacob R., Risse, Stefan, Müller, Sandra, Peschel, Thomas, Rohde, Mathias
Zdroj: In Microelectronic Engineering August 2011 88(8):1986-1991
Databáze: ScienceDirect