Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp
| Autor: | Muehlberger, M., Boehm, M., Bergmair, I., Chouiki, M., Schoeftner, R., Kreindl, G., Kast, M., Treiblmayr, D., Glinsner, T., Miller, R., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Narzt, T., Lausecker, E., Fromherz, T. |
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| Zdroj: | In Microelectronic Engineering August 2011 88(8):2070-2073 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect