Improvement of PMMA electron-beam lithography performance in metal liftoff through a poly-imide bi-layer system
| Autor: | Yaghmaie, F., Fleck, J., Gusman, A., Prohaska, R. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2010 87(12):2629-2632 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect