The influence of N containing plasmas on low- k films
| Autor: | Verdonck, P., Aresti, M., Ferchichi, A., Van Besien, E., Stafford, B., Trompoukis, C., De Roest, D., Baklanov, M. |
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| Zdroj: | In Microelectronic Engineering 2011 88(5):627-630 |
| Databáze: | ScienceDirect |
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