The effect of pulsed laser annealing on the nickel silicide formation
Autor: | Chen, Hou-Yu, Lin, Chia-Yi, Huang, Chien-Chao, Chien, Chao-Hsin |
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Zdroj: | In Microelectronic Engineering 2010 87(12):2540-2543 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Chen, Hou-Yu, Lin, Chia-Yi, Huang, Chien-Chao, Chien, Chao-Hsin |
---|---|
Zdroj: | In Microelectronic Engineering 2010 87(12):2540-2543 |
Databáze: | ScienceDirect |
Externí odkaz: |