Influence of process parameters on hydrogen silsesquioxane chemistry at low voltage electron beam exposures
| Autor: | Rio, David, Siegert, Laurent, Derrough, Samir, Constancias, Christophe, Icard, Béatrice, Meynen, Herman, Pain, Laurent |
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| Zdroj: | In Microelectronic Engineering 2010 87(5):914-917 |
| Databáze: | ScienceDirect |
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