Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques
| Autor: | Bolten, Jens, Wahlbrink, Thorsten, Koo, Namil, Kurz, Heinrich, Stammberger, Stefan, Hofmann, Uli, Ünal, Nezih |
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| Zdroj: | In Microelectronic Engineering 2010 87(5):1041-1043 |
| Databáze: | ScienceDirect |
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