Full wafer microlens replication by UV imprint lithography

Autor: Schmitt, H., Rommel, M., Bauer, A.J., Frey, L., Bich, A., Eisner, M., Voelkel, R., Hornung, M.
Zdroj: In Microelectronic Engineering 2010 87(5):1074-1076
Databáze: ScienceDirect