High resolution patterning – Preparation of VSB systems for 22 nm node capability
| Autor: | Hahmann, Peter, Boettcher, Monika, Klein, Matthias W., Stolberg, Ines A., Weidenmueller, Ulf |
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| Zdroj: | In Microelectronic Engineering 2010 87(5):1077-1081 |
| Databáze: | ScienceDirect |
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